By Perrin Walker, William H. Tarn
A set of cleansing and etching recommendations extracted from the open technical literature from approximately 1940 to the current, masking all significant steel parts, and nearly all of steel compounds presently occupied with the excessive know-how fields. a minimum of one answer is gifted for all significant metals and metal compounds in present use and/or less than improvement, for fast software or as a "starting position" for additional particular resolution improvement. Crystal constitution is emphasised all through, as a lot of chemical processing is at once regarding the crystal constitution of the fabrics in either basic learn and equipment fabrication. an information of bulk crystal airplane instructions, for instance, is vital within the structuring of many particular microelectronic units.
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Extra resources for CRC Handbook of Metal Etchants
Micro etch 99. Heat-tint etch 136. Milling etch 100. Heavy etch 137. Minimum etch 101. Hot etch 138. Mist etch 139. Molar etch -I- 102. Ice etch 140. Molten flux etch -N- 103. Immersion etch 104. Induced damage etch 141. Named etch 105. Initial etch 142. Native oxide etch 106. Ion (gas) etch 143. Neutral etch 107. Irradiation etch 144. Nitride etch 108. Isotropic etch 145. Normal etch -J- 109. Jar etch -O146. Oil etch 110. Jet etch 147. Orientation etch 111. Junction etch 148. Oxide cleaning etch 149.
Thermal etch 184. Rough etch 230. Thimble etch 231. Thinning etch -S- 232. Trim etch 233. Tumble etch 185. Sand etch 186. Satin etch -U- 187. Saturation etch 188. Saw (acid) etch 234. Ultrasonic etch 189. Scale etch 235. Used etch 190. Seeded etch 191. Segregate etch -V- 192. Selective etch 193. Sequence etch 236. Vacuum etch 194. Series etch 237. Vapor etch 195. Shaping etch 238. Vapor degrease 196. Shim etch 239. Via-hole etch 197. Short etch 240. Vibration etch 198. Sizing etch 199. Slosh etch 200.
The © 1991 by CRC Press LLC 27 acid concentrations are varied, the ethanol replaced by methanol, and both solutions are now used on other metals, such as the wide range of brass and bronze . . C. The Sirtl etch (lHF:2CrO3), developed in the early 1960s, has been a major preferential etchant for dislocation and defect development, initially on silicon, now on many other metals and metallic compounds. Since its inception, a dozen other HF:CrO3-type solutions have been developed for improved defect enhancement in general or for specific type defects.
CRC Handbook of Metal Etchants by Perrin Walker, William H. Tarn