By Liu, H.; Dandy, D.S.

ISBN-10: 0815513801

ISBN-13: 9780815513803

ISBN-10: 0815516878

ISBN-13: 9780815516873

This booklet offers an up-to-date, systematic evaluation of the most recent advancements in diamond CVD strategies, with emphasis at the nucleation and early development phases of diamond CVD. the target is to familiarize the reader with the medical and engineering features of diamond CVD, and to supply skilled researchers, scientists, and engineers in lecturers and with the newest advancements during this transforming into box.

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Crystal quality and phase purity are both optimized around a pressure value of4 kPa (30 ton-). At 665 Pa (-5 ton) an amorphous film covers the substrate and ball-like particles form. ~ 2 4 6 1 8 10 12’ Pressure @Pa) Figure 6. 5 39 Substrate Materials and Pretreatment Methods Diamond has been nucleated and grown on diamond, plus a large variety of non-diamond substrates, including metals, semiconductors, insulators, graphite, and even fused silica glass, such as MO, W, WC, Ta, Cr, Co, Pt, Au, Al, Cu, Ni, Fe, stainless steel, NiAl, NisAl, FeSi,, Ti, Ti-2Al-1 SMn, Ti-6Al-4V, TiN, TIC, Si, SIC, S&N,, silica, SiAlON, MgO, Al,O,, cBN, and Y_ZrO, ~~~~~~1~~~~1~~~1~~~1[1171[160l~~t~~l h ong these, Si wafer is probably the most commonly used substrate in diamond CVD.

The presence of impurities can increase nucleation densities. Higher nucleation rates can be obtained with halogen/hydrogen mixtures than with methane/hydrogen mixtures. W71 The presence of a large amount of oxygen in a plasma etches the sp2 carbon phase which nucleates more easily than diamond,[2211 and the quality and yield of diamond particles may be improved when oxygen is added. l220l Substantial production of diamond particles (5-450 run in diameter) have been achieved at linear growth rates on the order of 102- 1O4pm h-’ due to the addition of diborane.

Clearly, for substrate temperatures lower than SOO’C, the crystallite size increases with increasing substrate temperature. These results demonstrated that the crystallite size, surface roughness and hence optical transparency as well as other properties of diamond films can be tailored by varying the substrate temperature. 7 Substrate Position and Size Substrates are usually immersed in the plasmas in MW, DC and RF PACVD processes or separated from the plasmas in DC and RF thermal plasma CVD processes.

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Diamond Chemical Vapor Deposition by Liu, H.; Dandy, D.S.

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